E-BEAM Protocol

  • Mount up to 4 wafers to the stage using screws with washers. Use care to not overtighten the screws as this can cause cracks in the wafer
  • Set Ti crucible to active using the hearth controller
  • Press the big red button to vent the chamber
  • Once the pressure reaches atmospheric (~7.6x102 torr), unlatch and open the door
  • Mount the stage to the ceiling of the E-BEAM evaporation chamber with the center screw
  • Check the level of titanium in the crucible. If needed, add more pellets (the crucible should be between 1/2 and 2/3 full). Do not overfill, as this can cause the rotating hearth to jam.
  • Vacuum any loose debris from the floor of the chamber, as well as around the O-ring and the door mating surface
  • Clean the O-ring with isopropanol and a cleanroom wipe, as well as the door mating surface
  • Shut the door and latch shut (~ finger tight)
  • Press the big green button to begin venting down the chamber
  • Wait 3-5 hours or until the chamber reaches a pressure of ~1.0x10-6 torr
  • Turn on main power switches
  • Turn main power key to on
  • Wait ~10 seconds for fans and relays to turn on
  • Press main power reset, then main power on
  • Sweep select on
  • Select titanium film on main controller screen
  • Press start. The screen should show `ready'
  • Press start once more
  • Press manual mode
  • Open the E-Gun shutter
  • Using the hand controller, set power to 3.1-3.3%
  • Wait for the titanium to heat. When the evaporation rate passes ~1.0 Å/sec, open the sample shutter and reset the evaporation counter simultaneously
  • Deposit 400 Å of titanium, keeping the evaporation rate between 1.0-2.0 Å/sec
  • Once 400 Å of titanium has been deposited, press stop and close the sample shutter simultaneously.
  • Close the E-gun shutter
  • Turn off the sweep controller
  • Main power off, main power key off
  • Turn off main power switches
  • Press the big red button to vent the chamber
  • Once the pressure reaches atmospheric (~7.6x102 torr), unlatch and open the door
  • Remove the stage with attached wafers
  • Vacuum any loose debris from the floor of the chamber, as well as around the O-ring and the door mating surface
  • Clean the O-ring with isopropanol and a cleanroom wipe, as well as the door mating surface
  • Shut the door and latch shut (~finger tight)
  • Press the big green button to begin pressuring down the chamber
  • Remove wafers from the stage, and place screws & washers in correct storage bin

 

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